EUV Lithography
The breakthrough in world wide’s digitalization would not be possible without the latest generation of integrated circuits made by EUV lithography. Both the processing of wafers by EUV light as well as EUV metrology for components like EUV masks require ultra-precise positioning technology. Often, systems are operated in harsh environments with vacuum and high-energy radiation, allowing only a limited selection of materials.
Our portfolio addresses these challenges with positioning systems based on SmarSLIDE piezo inertia drive technology as well as complex SmarBOTIC parallel kinematics. These systems combine the benefits of a highly compact footprint and extreme precision, made by materials perfectly matching the special requirements of EUV applications.
