Lithography Mask Correction
In lithography, which is an essential technique for the fabrication of integrated circuits, structures down to nanometer size are transferred from photomasks to wafers. Any misalignment leads to mistakes in the patterns on the wafer and by that, to defective devices. Various correction techniques can help to minimize failures in the lithography process.
We offer positioning solutions combined with interferometry by SmarAct Metrology to correct the position of devices with nm accuracy in up to six degrees of freedom. SMARFLEX piezo scanners with travel ranges of 200µm, as well as SMARSLIDE piezo inertia drive stages provide the required precision. The result is a perfect alignment of mask and wafer at any time of the lithography process to ensure devices with highest quality.
Related Product Types
Rotation Stages
Compact and high resolution rotation stages.
PICOSCALE Interferometer
All PICOSCALE products are based on a Michelson interferometer, a precise method to measure displacements and vibrations. The Michelson interferometer consists of a wavelength-stabilized laser, a beam splitter, a target and a reference mirror.
At the beam splitter, the light from the laser is divided into two arms. One arm is directed to the target surface while the other is directed to the reference mirror. After the light of both arms is reflected by the target surface and reference mirror, respectively, it travels back to the beam splitter. Here , both arms recombine and interference takes place.
The interference signal contains information on the displacement of the target surface with respect to the reference mirror.
CLS-Series
CLS positioners with exchangeable drive units are the best choice for multi-axis setups in applications requiring high uptime.
PLF Series
Nanopositioning scanner stages with piezo-driven mechanical flexures.