Surface Cleaning for Reliable Electrical Contact

A clean, conductive sample surface is critical for accurate electrical analysis of semiconductor devices.

Contaminants such as carbon residues, native oxides, adsorbed water, and organic molecules can significantly degrade probe contact quality and signal integrity. With SmarProbe’s integrated surface cleaning option, these layers are efficiently removed — including native oxides like SiO₂ on silicon.

To ensure a seamless and uninterrupted nanoprobing workflow, in-situ cleaning or oxide removal can be performed directly at the probing site, eliminating the need for additional sample preparation steps and maximizing measurement reliability.